Focus Topics

IKZ R&D Focus Topics

The research departments at IKZ are organized in a 2 x 2 matrix structure to promote cooperation between all departments (see illustration above). This goes along with a high level of interdisciplinarity in our research and development work, which is a corner stone for the success of our projects with academic and industrial partners. This concept is particularly evident in our selected focus topics.

Semiconductor-based Quantum Materials

Isotopically pure silicon-28 crystals

The IKZ FZ-Si (Floating-Zone-Silicon) group in the section Volume Crystals / Semiconductors supports academic and industrial research by its expertise on isotope pure crystals like silicon-28.

This expertise is also used inhouse by our IKZ section Nanostructures & Layers / Semiconductor Nanostructures which works on 28Si-based heterostructure approaches for the design of scalable spin qubits as the core of quantum computers.



Leibniz ScienceCampus GraFOx II

Basic research on oxides and their growth for electronic applications

IKZ is a strong partner in the Leibniz Science Campus ´Growth and Fundamentals of Oxides` (GraFOx), selected for funding its second phase by  the Leibniz Association. The Science Campus, managed at IKZ essentially by the section Materials Science / Experimental Characterization, is devoted to study in particular the basic research of sesquioxides for future oxide electronic applications.

It involves contributions from IKZ sections Materials Science / Experimental Characterization, Volume Crystals / Oxide & Fluorides and Nanostructures & Layers / Thin Oxide Films.



Center for Laser Materials

Innovative materials for laser applications

The Center for Laser Materials at IKZ belongs to the section Application Science / Crystals for Photonics and works closely with the IKZ section Volume Crystals / Oxides & Fluorides and their junior research group "Fluoride Crystals for Photonics Applications".

It is established to act as one-stop shop to support academic and industrial partners on research & development of laser materials that open up new wavelength ranges, enable more efficient laser operation or higher output power.




ERDF Application Laboratory

Materials for Oxide Electronics

The ERDF Application Lab ´Materials for Oxide Electronics` is a part of the section Nanostructures & Layers / Thin Oxide Films. Its mission is to promote innovative applications in the area of future oxide electronics by tailoring the properties of functional oxide thin films. Examples are given by biomedical ferroelectric sensors for Internet of Things, active x-ray optics for time resolved studies or next generation Ga2O3 power electronics. The IKZ section Materials Science / Experimental Characterization is strongly involved to promote these activities.




Beta-gallium oxide

Next generation power electronics

Modern society is based on a high number of electrical systems in communication, industrial production, e-mobility etc. A central challenge is here the efficient and climate friendly conversion of electrical energy so that EU Green Deal targets can be reached. Silicon carbide (SiC) and gallium nitride (GaN) reach higher breakdown field strengthes than silicon so that compact device architectures can be realized by more sustainable process technologies. β-Ga2O3 crystals reach an even twice as high breakdown field strength with lower on-resistance values so that this material system is considered as a promising candidate for next generation power electronics. 

IKZ is today internationally leading in the area of Czochralski-volume crystal growth of β-Ga2O3 and the epitaxy of functional β-Ga2O3-layers by metal organic vapor phase deposition (MOVPE). These activities are intensively supported by our Materials Science / Experimental Chracterization to study fundamental physics phenomena and Application Science / Crystals for Electronics for substrate preparation.