Joint Labs & Support Labs

Labs

German-Chinese Joint Lab (Dielectrics)

The German-Chinese Joint Lab between the School of Electronic Science and Engineering at Xi´an Jiaotong University and the Leibniz-Institut für Kristallzüchtung (IKZ) and was founded on the occasion of the international Workshop ´Oxide & Graphene` which took place from 14th to 15th January 2020. Our mission is to join forces on the long-term perspective of research and education in the area of dielectrics and 2D materials, covering fundamental as well as device physics.

 

Dielectric oxide layers and 2D materials with their plethora of functional properties are in the focus of worldwide research to understand their physical properties on the atomic – scale and to engineer their functional characteristics for future device applications. However, the complexity of these materials systems in terms of synthesis, thin film deposition, characterization as well as device processing and integration steps often exceeds the capacities available at individual laboratories. Hence, IKZ and Jiaotong University in Xi´an decided to establish a joint lab and benefit from synergies in complementary research activities and student education. Online lectures, exchange of PhD students and international workshops will be undertaken to promote the common goals. Currently, research focuses on the development of lead-free ferro-/piezoelectric layers for green technology in application areas like sensing & energy harvesting e.g. for the future Internet of Things (IoT). Furthermore, the fundamental physics and processing steps of 2D materials are investigated with the perspective to engineer future functional 3D crystals through advanced layer-by-layer transfer processes.

Xi'an Jiaotong-Universität:
Head: Prof. Gang Niu
Prof. Gang Niu´s webpage:  http://gr.xjtu.edu.cn/web/gangniu
International School on Dielectics: http://esteie.xjtu.edu.cn/ 

IKZ:
Head: Dr. Jutta Schwarzkopf
Section: Nano Structures & Layers / Thin Oxide Films
Dr. Jens Martin
Section: Nano Structures & Layers / Thin Oxide Films / Topic: „2D goes 3D” by Layer Transfer

Contact IKZ

Dr. Jutta Schwarzkopf

Ph. +49 30 6392 3053

Email

Contact Xi´an Jiaotong University

Prof. Gang Niu

Ph. +86 29 8266 5670 8024

Email

Joint Lab for Electron Microscopy Adlershof (JEMA)

The joint lab for electron microscopy is a facility operated by the Leibniz-Institut für Kristallzüchtung and Humboldt-Universität zu Berlin which shares the excellent equipment of both institutions, to develop the most modern methods in electron microscopy and make them available for both institutions and their partners to study structure property relations in crystalline materials. 

 

Electron microscopy is the most versatile technique to obtain correlated information on structural and physical properties of solids with high spatial resolution. Transmission electron microscopy and scanning transmission electron microscopy made tremendous methodological advances in the last years. Due to the possibility to realize abberation corrected lenses true atomic resolution can be obtained with a resolution to 0.05 nm and a precision in the pm range. Analytical methods now allow for atomic resolution chemical mapping and electron loss spectroscopy achieves energy resolution that competes with that achievable in synchrotrons. The development of fast cameras with single electron sensitivity and sample holders that allow to follow processes in situ under biasing, at high temperature and under ambient pressure.

JEMA joins latest equipment in structural and analytical electron microscopy. While IKZ provides an aberration corrected (S)TEM (FEI Titan 80-300) equipped with a fast CETA2 camera (up to 400 frames per second) and latest in-situ holders that allow for operation under biasing and heating (Protochips Fusion) and at various gas atmosphere up to atmospheric pressure and temperatures up to 1000°C, Humboldt-Universität provides its (S)TEM with energy dispersive spectroscopy and energy loss spectroscopy.

The Leibniz-Institut für Kristallzüchtung in addition to transmission electron microscopes provides two scanning electron microscopes among them a fully analytical Dual Beam microscope (FEI Nova 600) that allows for structuring samples by an ion beam, and preparing electron transparent lamella from selected areas of a sample and lifting them out for further analysis in the TEM. This microscope provides in addition energy dispersive and wavelength spectroscopy and electron backscatter diffraction. A second, latest generation SEM Thermo Fisher Apreo S with three in-lens detectors and a STEM detector is equipped with a He cooling stage and a Gatan Monarc CL system to study optical properties of semiconductors.

JEMA has been the first joint activity in the field of electron microscopy in Adlershof. A similar centre exists now between Helmholtz Zentrum Berlin und HU Berlin in the field of cryomicroscopy. Other joint labs are on the way, all of them offering complementary equipment, thus making the Campus Adlershof a true centre for electron microscopy in Berlin. 

Head of Section

Dr. Martin Albrecht

Ph. +49 30 6392 3094

Email

IKZ-DESY Joint Lab

The IKZ-DESY Joint Lab between the Leibniz-Institut für Kristallzüchtung (IKZ) and the German Electron-Synchrotron (DESY) bundles and coordinates the activities of IKZ on the Science Campus Hamburg Bahrenfeld. Located in the Center for X-Ray Nanoscience (CXNS), it is an integral part of the cooperation between the two institutions. The Joint Lab supports the IKZ in-house research by offering access to advanced Synchrotron methods. In addition, crystalline materials from IKZ and advanced methods for research at synchrotrons are being developed to improve the performance of existing and future lightsources. As a third pillar the Joint Lab together with DESY Innovation Office aims to forward the transfer of original research toward the market, e.g., via foundation of StartUps.

 

The IKZ research group X-Ray Optics and DESY Nanolab operate a joint laserlab for time-resolved ultrafast spectroscopy at the IKZ-DESY Joint Lab. The setup is open for experimental characterization of IKZ materials and methods using various optical techniques. IN addition, the lab is used for preparation experiments for synchrotron beamtimes.

Contact IKZ

Dr. Peter Gaal

Ph. +49 30 6392 2858

Email

Contact DESY NanoLab

Prof. Dr. Andreas Stierle

Ph. +49 40 8998 2005

Email

Support Lab: ERDF (European Regional Development Fund) Application Laboratory "Materials for Oxide Electronics”

Since March 2017, the ERDF Application Laboratory has been pursuing the goal of developing oxide functional layers with high structural perfection for application-relevant device test structures like for example semiconducting gallium-oxide layers (Ga2O3) for vertical power devices,  resistively switchable strontium-titanate layers (SrTiO3) for ReRAMs and piezoelectric potassium-sodium-niobate layers ((K,Na)NbO3) for acoustic surface wave sensors.

 

This includes the deposition and characterization of single-crystalline, oxide layers with low defect density and defined electrical and structural properties tuned by doping and lattice strain. In order to achieve a high structural perfection of the layers, the section "Thin Oxide Films" uses the method of metal-organic vapor phase epitaxy (MOVPE), which is already the deposition method of choice in industry due to its scaling potential. In the application laboratory we are looking for synergies especially with regional academic and industrial partners.

Contact

Dr. Jutta Schwarzkopf

Ph. +49 30 6392 3053

Email

Support Lab: Chemical Metrology

An important prerequisite for the reliable evaluation of test results in crystal growth is the regular measurement of the chemical compositions of impurity concentrations in starting materials and crystals.

 

At the IKZ, measurements are performed in particular with "Inductively Coupled Plasma Optical Emission Spectroscopy" (ICP-OES) and x-ray fluorescence analysis (XRF). Prior to the actual ICP-OES measurement, the materials to be measured must first be digested using a suitable method, which must be developed specifically for each material and impurity. Usually this involves grinding and microwave digestion in acidic or basic solution. XRF measurements are mainly used for the planar visualization of composition and impurities with a resolution of 25 µm. The core competence of IKZ is the measurement of oxidic (e.g. Ga2O3, REScO3) and fluoridic (CaF, KTF) materials.

On request, the IKZ also offers measurement services for external customers for the materials mentioned above.

Contact

Dr. Thomas Straubinger

Ph. +49 30 6392 3123

Email

Support Lab: Crystal Machining

At the IKZ, crystals (Si, Ge, GaAs, InP, oxides, fluorides, AlN) with very different, in particular mechanical, properties are produced and have to be processed into tailor-made samples as preparation for different characterization methods.

 

For structural and optical characterization, wafers or longitudinal sections with polished surfaces are typically produced and then etched or irradiated. For the production of the required surface quality, several laboratory polishing machines are available on which polishing can be carried out with different polishing agents using purely mechanical but also chemical-mechanical processes. For laser applications, 3D samples are also required for which exact angles of the sample surfaces to each other must be realized. In addition to precise sawing and polishing machines, x-ray and laser measuring devices are available for this purpose, with which the samples can be precisely aligned before processing.

On request, the IKZ also offers processing services for external customers for the materials mentioned above.

Contact

Dr. Thomas Straubinger

Ph. +49 30 6392 3123

Email

Support Lab: Test structure lab

To bridge the gap between crystal characterization and prototype development, we are fabricating test devices from epitaxial thin films and microscopic 2D-crystals for electrical characterization. We employ electron beam lithography and direct laser writing for microscopic patterning, while metal contacts are produced by standard evaporation techniques. The test structure lab is operated in collaboration with Prof. T. Masselink and Prof. S. Fischer, Physics Department, Humboldt University, Berlin.

 

Thin films are often employed in devices in which large electric fields are present and where local defects can affect device performance drastically. Microscopically small contacts minimize the chances of device failure and provide good statistics. Another application of lithography is the electrical characterization of exfoliated 2D-crystals as they have only microscopic lateral dimensions. Due to the irregular shape of the crystals, contact patterns must be designed individually.

Hao Chen, Pinjia Zhou, Jiawei Liu, Jiabin Qiao, Barbaros Oezyilmaz, Jens Martin
Gate controlled valley polarizer in bilayer graphene
Nature Communications
DOI: 10.1038/s41467-020-15117-y

Contact

Dr. Jens Martin

Ph. +49 30 6392 2857

Email