Ultra-thin films and nanostructures exhibit a large application potential for microelectronic, optoelectronic and ferroelectric devices, for sensors and new solar cells as well as for thermoelectric energy converter and lithium ion batteries. For this purpose, well-ordered novel films and film structures with targeted chemical composition and well-defined electric properties are grown on single-crystalline substrates.
The department focus on research activities in the fields of the fabrication of transparent, semiconducting films, the growth of lead-free ferroelectric oxide films with tunable domain arrangement, the manipulation of physical properties of thin films by controlled incorporation of lattice strain (strain engineering) as well as the formation of three-dimensional crystalline structures on a nanometer scale.
In doing so, one main aspect is the correlation between film structure on a microscopic scale and their macroscopic functional properties. Modern epitaxy and deposition techniques like the metal-organic chemical vapor deposition (MOCVD), the molecular beam epitaxy (MBE) and pulsed laser deposition (PLD) are applied.
Further key activities of the department include thermodynamic investigations with regard to phase diagrams of utilized materials and nucleation of crystalline structures, evaluation of transport processes and characterization of surfaces.
Optimum requirements exist at IKZ to combine on the one hand growth of perfect single crystals, preparation of single-crystalline substrates, deposition of epitaxial films and nanostructures with well-adjusted electric and functional properties on the other hand.
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