The ability to rationally design materials with specific properties is a key driver in materials science and condensed matter physics. Freestanding oxide membranes (FOM) offer new avenues for overcoming the limitations of conventional oxide epitaxial growth techniques, which rely on specific substrates and synthesis conditions.
Advances in the synthesis and handling of FOMs enable the design and creation of novel materials with previously inaccessible interface symmetries, stacking configurations, and atomic reconstructions. This opens up new prospects for exploring physics and developing innovative device architectures using atomically engineered complex oxides.
This field of research is still in its early stages. Further scientific and technological advances are needed to fully realize the potential of freestanding oxide membranes. The newly published roadmap provides an overview of the current state of research, outlines future development pathways, and examines opportunities, challenges, and guiding principles for this field of research.
The IKZ is contributing its expertise in this field to the international roadmap: The section “Thin Oxide Films” and the “Layer Transfer” group were invited to contribute a chapter on “Oxide Freestanding Membranes Fabricated via Metal-Organic Chemical Vapor Deposition (MOCVD).” The chapter first provides an overview of the MOCVD process for oxide perovskites. It then briefly discuss structural phase transitions in freestanding (K,Na)NbO₃ membranes.
“Roadmap on Freestanding Oxide Membranes”
JPhys Materials
DOI 10.1088/2515-7639/ae998d
Contact:
Leibniz-Institut für Kristallzüchtung (IKZ)
Dr. Jutta Schwarzkopf
Section Dünne Oxidschichten
Phone: +49 (0) 30 / 246 499 308
Email
Dr. Jens Martin
Group Layer Transfer
Phone: +49 (0) 30 / 246 499 301
Email
